“Mr. Mayandi Jeyanthinath
& Dr. Richard Feynman”


“There is plenty of room at the
bottom”
– Richard Feynman
“There may be
plenty of galaxies at the bottom”
– Mayandi Jeyanthinath
My Supervisors:
1. Professor Terje Finstad
http://www.fys.uio.no/person/info.php?person=210&lang=NO
2. Professor Andrej Kuznetsov
Studies:
Address for correspondence: terje.finstad@fys.uio.no
Introduction:
In the search of the galaxies we are
in Nanodots (Nano-structures which confine electrons in all three
directions are called “quantum dots” (QDs) or “nanodots” (nds/ncs).
We have certain tasks, which are as
follows.
·
Firstly, a detailed study, to optimize the growth conditions
of the ncs in order to achieve uniform distribution and appropriate ncs size.
·
Secondly, the optical properties, such as photoluminescence
and electroluminescence of the ncs embedded in the SiO2 codoped with
Er will be studied. This is to study the 1.54 µm infrared luminescence which is
widely used in the optical telecommunication.
·
Finally, the
electrical properties of the ncs embedded SiO2 will be analyzed. We will also study the memory
effects from the metal insulator semiconductor (MIS) structures based on
semiconductor ncs embedded in SiO2.
In the past few
decades, there has been considerable interest in semiconductor nanostructures,
especially porous Si and Si
nanocrystals (ncs) because
of their potential applications toward Si-based
optoelectronic devices. Due to the novel quantum confinement effect much more
interest have been devoted to the growth of Si ncs and fabricated by a variety of techniques such as
co-sputtering, chemical vapour deposition, molecular
beam epitaxy, gas evaporation, laser ablation, ion
implantation and so on. Ncs have unique electrical, optical, magnetic and thermal
properties which are not observed in bulk materials. Uniform and regular arrays
of QDs have unusual electrical and optical properties
which make them potential candidates for future microelectronic and
optoelectronic devices. However, fabrication of these regularly spaced and
uniform size quantum dots is a still a challenging issue.
Working towards our
task we have currently studied the evolution of Ge, Si ncs in the different
structures, and also characterized using AFM, PL (photoluminescence), TEM and
FTIR studies. We have done preliminary studies to optimize the growth
conditions and we have also obtained interesting results. Here we have
introduced some of our new results. We
have also presented some of the results which are yet to be published.
STUDY 1:
Annett Thøgersen,
J. N. Mayandi, Arne Olsen and Terje
Finstad, In pursuit of Nanocrystal
Quantum Dots of Si in a thin SiO2 layer [Poster]. Scandem2005 23.05.05 - 26.05.05.
Structure of study 1:
a) SiO2(~20nm)
(sputtered)/ Si-rich SiO2(~8nm)(sputtered)/SiO2 (rto)(~8nm)/Si
b) Si-rich
SiO2(~8nm)(sputtered) /SiO2 (rto)(~8nm)/Si
In this study we are
concentrating to prepare a half-embedded Si ncs templates for the future applications (will be
delivered soon). Mostly the
electrical and optical properties are dependent on the size, shape and growth
mode of the embedded ncs. The challenging issue here
is to achieve this special type with a uniform distributed ncs.
In our study we are optimizing the growth parameters for the uniformity.

FIG 1.
AFM picture of above structure (a) annealed and etched for 10sec with 1%HF.
Further more TEM
studies are going on to understand the structural properties and to tune the
distribution of ncs. Then we will also investigate
the electrical properties of the embedded / half-embedded ncs.
STUDY 2:
1.
Heng, Chenglin; Finstad, Terje; Li, Yanjun; Mayandi, Jeyanthinath; Jørgensen, Sissel; Storås, Preben; Olsen, Arne; Gunnæs, Anette Eleonora. The
precipitation of Ge-rich nano
particles in an (Er,Ge) co
doped SiO2 matrix . ICMAT 2005; 03.07.2005 - 08.07.2005.
2. Finstad, Terje; Heng, Chenglin; Li, Yanjun; Mayandi, Jeyanthinath; Olsen,
Arne; Jørgensen, Sissel. Strong luminescence from Er
in an environment of Ge nanoclusters
in SiO2. First International Workshop on Semiconductor Nanocrystals;
10.09.2005 - 12.09.2005
Structure of study 2:
a)Ge+SiO2(sputtered)(~ 150nm )/ Ge+Er+SiO2(sputtered)(~50nm)/Ge+SiO2(sputtered)( ~350nm)/ Si
b) SiO2(sputtered)(~ 150nm )/ Er+SiO2(sputtered)(~50nm)/SiO2(sputtered)( ~350nm)/ Si
In this work, we have also reported on quite
strong 1.54µm photoluminescence (PL) from an (Er, Ge) co-doped SiO2 film deposited by rf magnetron sputtering, similar to the above
mentioned structure. The PL intensity reaches a maximum value after the film is
annealed at 700 °C for 30 min in N2.
From a FIG 1. The ,1.54 µm PL from the above structure (a) after
annealed at 500-1100 °C in N2 for 30 min. From a


FIG 3. FTIR measurements for the above
structures, to determine the oxide property, Ge precipitation and Er
characteristics. From b
From a


More details of PL study can be found in: C. L. Heng, T. G. Finstad, P. Storås, Y. J. Li, A.
E. Gunnæs and O. Nilsen, Appl. Phys. Lett. 85, 4475
(2004
STUDY 3:
1.
Finstad, Terje; Mayandi, Jeyanthinath; Foss, Steinar; Serincan, U.; Turan, Rasit. Luminescence
in ion beam synthesized quantum dots correlated with nanocrystal
depth and size distrubutions. IMMB2005; 05.09.2005 -
09.09.2005 (submitted)
2.
Mayandi, Jeyanthinath; Finstad,
Terje; Foss, Steinar; Serincan, U.; Turan, Rasit. Luminescence
from Si nanocrystals in
SiO2 films [Poster]. 22nd Nordic Semiconductor Meeting; (submitted)
Structure of
study 3:
SiO2(250nm) +Si(implanted)/ Si
We have studied the photoluminescence (PL)
(Fig.1) from Si nanocrystals
embedded in SiO2 and correlate these with the size and distribution
of Si nanoclusters. Si nanocrystals in thermal oxide
films (~250 nm) where fabricated by 100 keV Si ion implantation at various doses followed by high
temperature annealing. After annealing a sample implanted with a dose of 1x1017
cm-2 at 1050 C for two hours a broad photo luminescence peak
centered around 880 nm is observed. A dose of 5x1016 cm-2
yields a considerable blue shift of about 100 nm relative to the higher dose as
well as a reduction in intensity. Transmission electron microscopy is used to
characterize the microstructure of the SiO2 film has also be studied
(Fig.2). Finally we show an example of a series of AFM analysis (Fig.3) for
different depths in SiO2 film by etching for different times.






Electro-luminescence
Study: Under investigations……..
My Friend:
Co-Advisor:
Dr. Heng
Chenlin Chenglin
Heng (http://www.fys.uio.no/person/info.php?person=3776&lang=NO)
My senior’s:
1. Mr. Sean Erik
Foss
2. Dr. Yiu Yan Kan