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FACULTY OF MATHEMATICS AND NATURAL SCIENCES   -   Department of Chemistry

Welcome to the hompage of Ola Nilsen
    Norwegian version

Professional me:

I am currently a 1. amanuensis at Department of Chemistry, University of Oslo,and I am also connected to the Centre for Materials science and Nanotechnology (SMN) as well as Innovative Natural Gas Processes and Products (inGAP).

My research is within thin films made by the Atomic Layer Chemical Vapour Deposition (ALCVD, ALD, ALE) technique. This is a technique that enables one to build materials by atomic layers. In this way, we try to produce materials of known types and also new types of materials with yet unknown properties.

Some selected samples of what I do are:

  • Thin films of perovskites (ABO3 - type materials)
  • Simulations of growthdynamics of thin films
  • In situ measurement techniques
  • Thin films of organic-inorganic hybrid materials
  • Construction of ALD units

Departement of Chemistry, UiO

SMN, UiO

ALCVD@UiO

Publications

BALD2006

     
     

Contactinfo:


I am situated at ØU43 in the Chemistry building at Blindern.
Phone: 22855558 / 99476424
Mail: ola.nilsen@kjemi.uio.no

The chemistry building